NanoArc® Cerium Oxide and NanoArc® Aluminum Oxide dispersions feature small particle sizes, tightly controlled particle size distributions and unique crystal morphology allowing new performance benchmarks to be realized in polishing applications.
Architectural Glass Polishing
NanoArc® Cerium Oxide effectively polishes and cleans architectural glass by both chemically and mechanically removing micro-roughness on the glass that has built up from being exposed to outside elements. The extremely high surface area of the NanoArc® Cerium Oxide results in a highly efficient polishing activity leaving the glass surface smooth and defect free. This results in a window that has the ultimate shine!
Once the architectural window is polished back to its original condition, the window becomes hydrophilic (water-loving) so that water sheets down the glass. This sheeting action prevents water from beading up and leaving spots and streaks on the window as it dries. With this hydrophilic property, the window stays cleaner longer – which can help to reduce cleaning costs.
The performance benefits of the NanoUltraTM Super Hydrophilic Window Technology for professional window cleaners and window restoration experts can be found at www.nano-ultra.com.
Precision Glass and Metal Polishing
NanoArc® Cerium Oxide and NanoArc® Aluminum Oxide dispersions are used in the planarization of silicon wafers and the polishing of photomask blanks, lithography optics, high energy laser lenses and rigid memory substrates.
Manufactured with a proprietary plasma process, our NanoArc® Cerium Oxide are discrete single crystals that are nonporous and near theoretical density, which means the particles do not change shape or density during a polishing operation. Additionally, the technology enables the surfaces to be engineered to have high zeta potentials when the particles are dispersed in water. This ensures that the particles can be efficiently dispersed down to individual primary crystallites and that the dispersion will remain stable because of the high degree of electrostatic repulsion created between particles.
Polishing Electronics with Nanophase particles provides reproducible removal rates, increased planarity, very low defectivity and improved surface roughness. Shown are typical surface morphology after polishing with NTC ceria in water (Sq = 0.116 nm):