Nanophase to Present on Glass Polishing Techniques at Tucson Technical Workshop
Romeoville, IL (September 17, 2014) - Nanophase Technologies, Inc. announced today that it will present a paper on improving the efficiency and effectiveness of double-sided glass polishing at the American Precision Optics Manufacturers Association (APOMA) Tucson Technical Workshop in November.
The paper, “Optimizing Double-Sided Glass Polishing Using Rationally Designed Experiments,” explores the use of statistically designed experiments to help determine the polishing conditions that will optimize results and reduce cost. The experiments involve the use of a plasma-derived cerium oxide slurry to polish fused silica and consider the effect of particle and slurry chemistry, along with process conditions, on polishing performance.
“Double-sided polishing of glass parts is complex,” author Patrick Murray, Ph.D. said. “Without predictive capability of how slurry composition and process parameters interact, polishing is often conducted under less-than-optimal conditions and is therefore less effective. The use of designed experiments to optimize polishing conditions can shorten processes, reduce re-work and operation costs and improve yields and profitability.”
Murray will present the paper at the Tucson Technical Workshop, held Nov. 10-11 in Tucson, Ariz. This workshop will include discussions on freeform optics, cleaning, scratch and dig and other topics, as well as a tour of the University of Arizona’s mirror lab.
Authors include Patrick G. Murray, Ph.D.; Abigail R. Hooper; Harry W. Sarkas, Ph. D.; and Nate Hoffman. Read paper abstract