Nanophase to Highlight Optical Polishing Solutions at 2015 Photonics West Conference


Romeoville, IL (Jan. 27, 2015) – Nanophase Technologies Corporation announced today that it will highlight its cerium oxide and aluminum oxide optical polishing slurries at Photonics West 2015, Jan. 10-12 in San Francisco.


Nanophase cerium oxide and aluminum oxide slurries improve surface finishing quality across a variety of optical polishing processes. Tests performed in the company’s own optical polishing laboratory and in customer manufacturing facilities have demonstrated the considerable benefits of Nanophase slurries, including faster time to desired surface finish, improved slurry longevity, reduced sleeks and scratches, and reduced waste.


In addition to exhibiting at booth #4140 at the conference, Nanophase will also present results and insights from tests performed in their optical polishing laboratory. The presentation “Optimizing Profitability through Polishing Process Control,” will take place Tuesday, Feb. 10, 2015 at 3:30 p.m. in The Moscone Center Hall ABC South.


“By using Nanophase slurries to achieve the highest quality surface finish available in the industry, our customers are able to meet more rigorous product specifications and enter new markets,” Nanophase Vice President Kevin Cureton said. “We’re excited for the opportunity to share the proven benefits of our slurries with optical manufacturers at Photonics West.”


Nanophase opened its cutting-edge Optical Polishing Application Development and Customer Support Laboratory in September 2014 to enable new product development and provide customer application support and process simulation for a variety of precision surface finishing applications. The same highly trained chemists and engineers who run the lab also manufacture Nanophase slurries on site, closely monitoring process parameters to ensure precise particle distribution and optimal slurry performance while offering exceptional customer support.